发明名称 |
Projection lens and microlithographic projection exposure apparatus |
摘要 |
A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
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申请公布号 |
US2004150806(A1) |
申请公布日期 |
2004.08.05 |
申请号 |
US20030714573 |
申请日期 |
2003.11.14 |
申请人 |
BRUNOTTE MARTIN;HARTMAIER JURGEN;HOLDERER HUBERT;KAISER WINFRIED;KOHL ALEXANDER;KUGLER JENS;MAUL MANFRED;WAGNER CHRISTIAN |
发明人 |
BRUNOTTE MARTIN;HARTMAIER JURGEN;HOLDERER HUBERT;KAISER WINFRIED;KOHL ALEXANDER;KUGLER JENS;MAUL MANFRED;WAGNER CHRISTIAN |
分类号 |
G02B7/02;G02B1/02;G02B5/30;G03F7/20;H01L21/027;(IPC1-7):G03B27/54;G03B27/72 |
主分类号 |
G02B7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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