发明名称 Synthesizing semiconductor process flow models
摘要 Systems and methods of modeling a best-guess semiconductor process flow for fabricating a desired semiconductor device are provided. The best-guess process flow is modeled using an inverse modeling technique. This technique reverse engineers a desired semiconductor device to synthesize a model of a fabrication process that is likely to produce the desired semiconductor device. First, a desired device having one or more desired characteristics is modeled. Then, various process and material parameters, constraints, and actual measured data are used to synthesize one or more unique software models that represent a process flow likely to fabricate the desired device. If more than one process flow is modeled, various parameters are modified iteratively until a unique process flow model is synthesized.
申请公布号 US6772035(B2) 申请公布日期 2004.08.03
申请号 US20020150988 申请日期 2002.05.17
申请人 MICRON TECHNOLOGY, INC. 发明人 MOULI CHANDRA V.
分类号 G05B19/418;G06F17/50;G06F19/00;H01L21/00;(IPC1-7):G06F19/00 主分类号 G05B19/418
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