发明名称 |
Particle detection and removal apparatus for use on wafer fabrication equipment to lower tool related defects from particle contamination |
摘要 |
A portable particle detection and removal system (100) that connects to a house vacuum (200). A particle sensor (106) is connected between two hoses: one (102) connected to the house vacuum (200) and one (104) for vacuuming the wafer equipment chamber. A smaller diameter hose (104) may be used for vacuuming the wafer equipment chamber. The particle sensor detects (106) incoming particles and a particle count is displayed for the operator. A modulated cleaning system (112) modulates the vacuum pressure in the second hose (104) between two vacuum pressure states.
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申请公布号 |
US6771371(B2) |
申请公布日期 |
2004.08.03 |
申请号 |
US20010921364 |
申请日期 |
2001.08.02 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
SHERWIN LUCIUS M. |
分类号 |
H01L21/00;H01L21/683;(IPC1-7):G01N21/00;G01N1/00;G01N1/14;A47L9/02;A47L1/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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