发明名称 Stereolithographic methods for fabricating hermetic semiconductor device packages and semiconductor devices including stereolithographically fabricated hermetic packages
摘要 A stereolithographically fabricated, substantially hermetic package surrounds at least a portion of a semiconductor die so as to substantially hermetically seal the same. Stereolithographic processes may be used to fabricate at least a portion of the substantially hermetic package from thermoplastic glass, other types of glass, ceramics, or metals. The substantially hermetic package may be used with semiconductor device assemblies or with bare or minimally packaged semiconductor dice, including dice that have yet to be singulated from a wafer. The stereolithographic method may include use of a machine vision system including at least one camera operably associated with a computer controlling a stereolithographic application of material so that the system may recognize the position, orientation, and features of a semiconductor device assembly, semiconductor die, or other substrate on which the substantially hermetic package is to be fabricated.
申请公布号 US6770514(B2) 申请公布日期 2004.08.03
申请号 US20030353752 申请日期 2003.01.28
申请人 MICRON TECHNOLOGY, INC. 发明人 FARNWORTH WARREN M.
分类号 H01L21/56;H01L23/31;(IPC1-7):H01L21/44;H01L21/48;H01L21/50 主分类号 H01L21/56
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