发明名称 Photoconductive thin film for reduction of plasma damage
摘要 A semiconductor device (200) that includes a semiconductor substrate (210), semiconductor features (230, 235, 240, 260) located thereover and an insulating photoconductive layer (270) coupling the semiconductor features (230, 235, 240, 260). The photoconductive layer (270) is configured to provide conductivity between the semiconductor features (230, 235, 240, 260) in a presence of a plasma.
申请公布号 US6770937(B1) 申请公布日期 2004.08.03
申请号 US20030409560 申请日期 2003.04.08
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 KRISHNAN ANAND;KRISHNAN SRIKANTH
分类号 H01L23/485;H01L23/552;(IPC1-7):H01L23/62 主分类号 H01L23/485
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