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发明名称
在酸性浆体中侦测化学机械抛光端点之方法
摘要
一种用于在使用酸性CMP研磨浆之进行中化学机械研磨(CMP)循环中之测量氨气浓度之装置,该装置包含下列构件:a.一采集酸性CMP研磨浆样本之传递构件;b.一转换酸性CMP研磨浆为硷性研磨浆之转换构件;c.一检测硷性研磨浆中是否存在氨气之检测构件;d.一在进行中CMP循环之末端时发信号之侦测构件。
申请公布号
TW200413730
申请公布日期
2004.08.01
申请号
TW092117131
申请日期
2003.06.24
申请人
万国商业机器公司
发明人
李礼平;魏康;王心慧;史帝文G. 巴比;詹姆斯 吉尔霍利;史考特R. 克莱
分类号
G01N9/00
主分类号
G01N9/00
代理机构
代理人
陈长文
主权项
地址
美国
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