发明名称 |
METHOD FOR PREPARING PATTERNED COLLOID CRYSTALS |
摘要 |
PURPOSE: Provided is a method for preparing patterned colloid crystals, which uses selective polymerization of a polymer to form colloid crystals of a micro-patterned thin film type having a uniform thickness. CONSTITUTION: The method for preparing patterned colloid crystals comprises the steps of: filling a monomer solution for photopolymerization in the gaps of plate-like colloid crystals(1); and carrying out selective photopolymerization in the gaps of the colloid crystals by using a mask(2). Particularly, the monomer for photopolymerization is an acrylate monomer. Further, the colloid crystal is selected from the group consisting of SiO2, TiO2, ZnS, ZnO2, Fe3O4 and a mixture thereof. The method optionally further comprises at least one additional step of selective photopolymerization using an additional monomer and an additional mask. |
申请公布号 |
KR20040067506(A) |
申请公布日期 |
2004.07.30 |
申请号 |
KR20030004638 |
申请日期 |
2003.01.23 |
申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
KIM, SA RA;LEE, GI RA;PARK, YONG HAK;YANG, SEUNG MAN |
分类号 |
C30B29/60;G02B6/122;G03C5/00;G03F7/00;(IPC1-7):G03F7/00 |
主分类号 |
C30B29/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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