发明名称 METHOD FOR PREPARING PATTERNED COLLOID CRYSTALS
摘要 PURPOSE: Provided is a method for preparing patterned colloid crystals, which uses selective polymerization of a polymer to form colloid crystals of a micro-patterned thin film type having a uniform thickness. CONSTITUTION: The method for preparing patterned colloid crystals comprises the steps of: filling a monomer solution for photopolymerization in the gaps of plate-like colloid crystals(1); and carrying out selective photopolymerization in the gaps of the colloid crystals by using a mask(2). Particularly, the monomer for photopolymerization is an acrylate monomer. Further, the colloid crystal is selected from the group consisting of SiO2, TiO2, ZnS, ZnO2, Fe3O4 and a mixture thereof. The method optionally further comprises at least one additional step of selective photopolymerization using an additional monomer and an additional mask.
申请公布号 KR20040067506(A) 申请公布日期 2004.07.30
申请号 KR20030004638 申请日期 2003.01.23
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 KIM, SA RA;LEE, GI RA;PARK, YONG HAK;YANG, SEUNG MAN
分类号 C30B29/60;G02B6/122;G03C5/00;G03F7/00;(IPC1-7):G03F7/00 主分类号 C30B29/60
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