发明名称 METHOD FOR FABRICATING GALLIUM NITRIDE SUBSTRATE
摘要 PURPOSE: A method for fabricating a gallium nitride substrate is provided to reduce micro crack or bending occurring in a gallium nitride layer and fabricate a free standing gallium nitride substrate of a good quality by growing and separating a gallium nitride layer in a separate place like a growth chamber or a transfer chamber. CONSTITUTION: A gallium nitride buffer layer(41) is formed on a substrate(30) placed on a susceptor(36) in a growth chamber. Laser beam is irradiated to the lower direction of the susceptor to separate the gallium nitride buffer layer from the substrate. A gallium nitride layer is formed on the gallium nitride buffer layer separated from the substrate.
申请公布号 KR20040067703(A) 申请公布日期 2004.07.30
申请号 KR20030004936 申请日期 2003.01.24
申请人 LG ELECTRONICS INC. 发明人 LEE, HYEON JAE
分类号 H01L21/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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