发明名称 |
CANISTER FOR SEMICONDUCTOR FABRICATING PROCESS |
摘要 |
PURPOSE: A canister for a semiconductor fabricating process is provided to solve a problem that a gas exhaust pipe line is reduced in diameter or stopped by a scale formed in the gas exhaust pipe line by improving purification of reaction gas exhausted from a sealing receptacle through the gas exhaust pipe line. CONSTITUTION: Induced reaction gas is purified in a sealing receptacle having a purifying unit(260) in its inside. An end of a gas input pipe line(240) is inserted into the inside of the sealing receptacle, and the gas input pipe line induces the reaction gas. An end of a gas exhaust pipe line exhausts the reaction gas from the sealing receptacle, and the gas exhaust pipe line exhausts the reaction gas from the sealing receptacle. A filter(280) is installed in a connection part of the gas exhaust pipe line and the sealing receptacle.
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申请公布号 |
KR20040067002(A) |
申请公布日期 |
2004.07.30 |
申请号 |
KR20030003939 |
申请日期 |
2003.01.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HA, SANG ROK;KIM, IL GU;SEO, GI IL |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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