发明名称 |
VERTICAL HIGH VOLTAGE MOS TRANSISTOR |
摘要 |
PURPOSE: A vertical high voltage MOS(metal oxide semiconductor) transistor is provided to reduce on-resistance of a vertical high voltage MOS device by increasing the density of a drift region with respect to the same breakdown voltage. CONSTITUTION: A channel region is made of a body region of the first conductivity type that is formed in the lower part of an impurity region(8) of the second conductivity type formed under a gate(10). A drift region in which a pillar region(12) of the first conductivity type and a pillar region(20) of the second conductivity type are alternatively formed in a direction perpendicular to a channel longitudinal direction is formed under the channel region.
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申请公布号 |
KR20040066997(A) |
申请公布日期 |
2004.07.30 |
申请号 |
KR20030003933 |
申请日期 |
2003.01.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, MAENG YEOL |
分类号 |
H01L29/78;(IPC1-7):H01L29/78 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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