发明名称 VERTICAL HIGH VOLTAGE MOS TRANSISTOR
摘要 PURPOSE: A vertical high voltage MOS(metal oxide semiconductor) transistor is provided to reduce on-resistance of a vertical high voltage MOS device by increasing the density of a drift region with respect to the same breakdown voltage. CONSTITUTION: A channel region is made of a body region of the first conductivity type that is formed in the lower part of an impurity region(8) of the second conductivity type formed under a gate(10). A drift region in which a pillar region(12) of the first conductivity type and a pillar region(20) of the second conductivity type are alternatively formed in a direction perpendicular to a channel longitudinal direction is formed under the channel region.
申请公布号 KR20040066997(A) 申请公布日期 2004.07.30
申请号 KR20030003933 申请日期 2003.01.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, MAENG YEOL
分类号 H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L29/78
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