发明名称 NONVOLATILE SEMICONDUCTOR MEMORY AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory which can improve device reliability by suppressing fluctuation of a threshold voltage due to capacitance coupling by reducing capacitance across-floating electrodes. SOLUTION: The nonvolatile semiconductor memory which can be written and erased electrically comprises a silicon substrate 1, a plurality of element isolating parts 101 which are arranged to protrude from the silicon substrate 1 at a predetermined interval, floating electrodes 102 arranged between the element isolating parts 101, and a control electrode 104 laminated on the element isolating parts 101 and floating electrodes 102. The mutual interval between adjoining floating electrodes 102 is formed so as to be broader on the side away from the silicon substrate 1 than on the silicon substrate 1 side. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004214510(A) 申请公布日期 2004.07.29
申请号 JP20030001488 申请日期 2003.01.07
申请人 TOSHIBA CORP 发明人 KINOSHITA SHIGERU;HAZAMA HIROAKI
分类号 H01L21/8247;H01L27/115;H01L29/423;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
代理机构 代理人
主权项
地址