发明名称 |
Cleaning compositions containing hydroxylamine derivatives and processes using same for residue removal |
摘要 |
The present invention is directed to resist and etching residue removing compositions containing at least one nucleophilic amine compound possessing reduction and oxidation potentials, a two-carbon atom linkage alkanolamine compound, and optionally water and/or one or more corrosion inhibitors. The compositions may be substantially free of hydroxylamine, polar organic solvents, water, corrosion inhibitors, or a combination thereof. The compositions are useful in processes for removing resists and etching residue from metal or metal alloy substrates or substrate layers used in micro-circuitry fabrication.
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申请公布号 |
US2004147420(A1) |
申请公布日期 |
2004.07.29 |
申请号 |
US20030689620 |
申请日期 |
2003.10.22 |
申请人 |
ZHOU DE-LING;QIAO JING;LEE SHIHYING;PATEL BAKUL P.;HON BECKY MIN |
发明人 |
ZHOU DE-LING;QIAO JING;LEE SHIHYING;PATEL BAKUL P.;HON BECKY MIN |
分类号 |
B24B37/04;C09D9/00;C11D3/20;C11D3/30;C11D3/34;C11D3/43;C11D7/26;C11D7/32;C11D7/34;C11D7/50;C11D11/00;C23G1/10;C23G1/20;G03F7/42;H01L21/02;H01L21/306;H01L21/311;H01L21/321;H01L21/3213;H01L21/768;(IPC1-7):C11D1/00 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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