METHOD FOR PRODUCING AN INTEGRATED CIRCUIT ARRANGEMENT, IN PARTICULAR COMPRISING A CAPACITOR ASSEMBLY, IN ADDITION TO AN INTEGRATED CIRCUIT ARRANGEMENT

摘要

The invention relates to a method for producing an integrated circuit arrangement (100) comprising a capacitor (112). A dielectric layer (160) is structured with the aid of a hard mask during a two-stage etching process. The hard mask is subsequently removed if it is an electrically insulating hard mask. If the latter is an electrically conductive hard mask, parts of said mask can remain in the circuit arrangement (100). The integrated circuit arrangement can thus be produced without complex cleaning steps and in addition, the quality of the dielectric in the capacitor is extremely high.