发明名称 Method of manufacturing microneedle structures using soft lithography and photolithography
摘要 A method for manufacturing microneedle structures is disclosed using soft lithography and photolithography, in which micromold structures made of a photoresist material or PDMS are created. The micromold manufacturing occurs quite quickly, using inexpensive materials and processes. Once the molds are available, using moldable materials such as polymers, microneedle arrays can be molded or embossed in relatively fast procedures. In some cases a sacrificial layer is provided between the forming micromold and its substrate layer, for ease of separation. The microneedles themselves can be solid projections, hollow "microtubes," or shallow "microcups." Electrodes can be formed on the microneedle arrays, including individual electrodes per hollow microtube.
申请公布号 US2004146611(A1) 申请公布日期 2004.07.29
申请号 US20030727124 申请日期 2003.12.03
申请人 THE PROCTER & GAMBLE COMPANY 发明人 ARIAS FRANCISCO;SHERMAN FAIZ FEISAL;OWENS GROVER DAVID
分类号 B81C1/00;A61B5/15;A61M37/00;B81B1/00;(IPC1-7):C12C1/027 主分类号 B81C1/00
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