| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of producing a porous silica film which has a low dielectric constant and excellent hydrophobicity without requiring hydrophobization treatment after its production, and to provide the porous silica film obtained by the method. SOLUTION: In the method of producing a porous silica film, alkoxy silanes are subjected to hydrolysis and condensation in the presence of a surfactant and a cyclic siloxane to prepare a coating liquid, the surface of a substrate is coated with the coating liquid, and next, the coated film formed on the surface of the substrate is heated. By the method of producing the porous silica film, the porous silica film having a reduced dielectric constant owing to the increase of its porosity, and having excellent hydrophobicity can be obtained. COPYRIGHT: (C)2004,JPO&NCIPI |
