发明名称 |
Method for producing a semiconductor component and a semiconductor component produced according to this method |
摘要 |
A method for manufacturing a semiconductor component (100; . . . ; 700), a multilayer semiconductor component in particular, preferably a micromechanical component, such as a heat transfer sensor in particular having a semiconductor substrate (101), in particular made of silicon, and a sensor region (404). For inexpensive manufacture of a thermal insulation between the semiconductor substrate (101) and the sensor region (404) a porous layer (104; 501) is provided in the semiconductor component (100; . . . ; 700).
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申请公布号 |
US2004147057(A1) |
申请公布日期 |
2004.07.29 |
申请号 |
US20040473762 |
申请日期 |
2004.03.30 |
申请人 |
BENZEL HUBERT;WEBER HERIBERT;SCHAEFER FRANK |
发明人 |
BENZEL HUBERT;WEBER HERIBERT;SCHAEFER FRANK |
分类号 |
B81C1/00;B81B1/00;B81B3/00;(IPC1-7):H01L21/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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