发明名称 Method for producing a semiconductor component and a semiconductor component produced according to this method
摘要 A method for manufacturing a semiconductor component (100; . . . ; 700), a multilayer semiconductor component in particular, preferably a micromechanical component, such as a heat transfer sensor in particular having a semiconductor substrate (101), in particular made of silicon, and a sensor region (404). For inexpensive manufacture of a thermal insulation between the semiconductor substrate (101) and the sensor region (404) a porous layer (104; 501) is provided in the semiconductor component (100; . . . ; 700).
申请公布号 US2004147057(A1) 申请公布日期 2004.07.29
申请号 US20040473762 申请日期 2004.03.30
申请人 BENZEL HUBERT;WEBER HERIBERT;SCHAEFER FRANK 发明人 BENZEL HUBERT;WEBER HERIBERT;SCHAEFER FRANK
分类号 B81C1/00;B81B1/00;B81B3/00;(IPC1-7):H01L21/00 主分类号 B81C1/00
代理机构 代理人
主权项
地址