发明名称 PHOTOSENSITIVE ELEMENT AND METHOD FOR MANUFACTURING THE SAME, RESIST PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive element excellent in followup ability of a photosensitive resin composition layer to ruggedness on a substrate, a method for manufacturing the same, a resist pattern forming method using the photosensitive element, and a method for manufacturing a printed wiring board. <P>SOLUTION: The photosensitive element comprises a support and a photosensitive resin composition layer formed on the support, wherein the photosensitive resin composition layer comprises (A) 40-80 pts. wt. of a binder polymer, (B) 20-60 pts. wt. of an ethylenically unsaturated polymerizable monomer, (C) 0.001-10 pts. wt. of a photopolymerization initiator and (D) 0.001-5 pts. wt. of an organic solvent, based on 100 pts. wt., in total, of the components (A) and (B). <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004212584(A) 申请公布日期 2004.07.29
申请号 JP20020381307 申请日期 2002.12.27
申请人 HITACHI CHEM CO LTD 发明人 ABE TAKUJI
分类号 G03F7/004;C08F291/00;H05K3/06;H05K3/18 主分类号 G03F7/004
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