发明名称 MANUFACTURING METHOD OF SUPERCONDUCTING ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method capable of removing selectively an amorphous oxide produced on the surface of an insulating oxide thin film without affecting on a barrier layer for interface reforming type bonding. SOLUTION: The manufacturing method of a superconducting element comprises a process for laminating a lower electrode layer formed of an oxide superconducting thin film and an insulating oxide thin film, a process for working the laminated film of the lower electrode layer and the insulating oxide thin film through ion milling employing a rear gas and forming an amorphous layer on the working end face of the lower electrode layer, a process for purifying the surface of the insulating oxide thin film by exposing the worked lamination film into the active atmosphere of halogen series gas or a reduction gas, a process for forming a barrier layer by heating the lamination film in an oxygen atmosphere to crystallize the amorphous layer on the working end face of the lower electrode layer, and a process for laminating an upper electrode layer formed of an oxide superconducting thin film, on the lamination film. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004214367(A) 申请公布日期 2004.07.29
申请号 JP20020381221 申请日期 2002.12.27
申请人 TOSHIBA CORP;INTERNATL SUPERCONDUCTIVITY TECHNOLOGY CENTER 发明人 KATSUNO HIROSHI;YOSHIDA JIRO
分类号 H01L39/24;(IPC1-7):H01L39/24 主分类号 H01L39/24
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