发明名称 |
Method and apparatus for cleaning a CVD chamber |
摘要 |
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.
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申请公布号 |
US2004144490(A1) |
申请公布日期 |
2004.07.29 |
申请号 |
US20030354214 |
申请日期 |
2003.01.27 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ZHAO MAOSHENG;ROCHA-ALVAREZ JUAN CARLOS;SHMURUN INNA;SEN SOOVA;LIM MAO D.;VENKATARAMAN SHANKAR;LEE JU-HYUNG |
分类号 |
C23C16/44;H01J37/32;(IPC1-7):H01L21/306 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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