Method of designing a thermal physical vapor deposition system

摘要

The need is met according to the present invention by providing a method of designing a system for thermal vapor deposition that includes a material to be deposited on a workpiece, an elongated container for containing the material, a heater for heating the material in the container to vaporize the material, the container defining n apertures for emitting the vaporized material in an elongated pattern in the elongated direction, that includes the steps of: calculating the total source throughput Q per unit length at a deposition rate of interest; calculating the internal pressure P of the source required to produce Q for the total aperture conductance CA of the source; modeling the system as a ladder network of conductances, the elongated container having a container conductance CB and conductances Cb=nCB, between apertures, and the apertures having a combined conductance 1 $C_A=\sum _{i=1}^n{C}_{\mathrm{ai}},$ where Cai are individual aperture conductances; and using the latter network model, designing the system to have a desired pressure uniformity along the elongated direction of the container.