| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method capable of efficiently forming a plurality of circuits of the same shape and a plurality of discriminating marks for discriminating the circuits of the same shape from each other on a single processing board through a step and repeat exposure method. <P>SOLUTION: A reticle is used where a circuit pattern for forming the desired circuits and a discriminating mark pattern for forming the discriminating marks are provided. When an exposure process is carried out through the step and repeat exposure method, the circuit pattern and the discriminating mark pattern adjacent to it are exposed to light at the same time. The discriminating mark pattern is varied in shape for each circuit by changing an irradiating position by blinds for each exposure. By this setup, the circuits of the same shape and the discriminating marks for discriminating the circuits from each other can be efficiently formed. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
