发明名称 METHOD FOR THE PRODUCTION OF MONOCRYSTALLINE STRUCTURES AND COMPONENT
摘要 According to prior art, structural errors in substrates in epitactic crystal growth are often carried over from the substrate on which the new material is to be deposited. This leads to a reduction in mechanical properties. According to the inventive method, an intermediate layer (10) is deposited prior to the deposition of epitactic material. Said intermediate layer prevents structural errors in the substrate (7) from being carried over to the newly filled area (13,16).
申请公布号 WO2004063429(A1) 申请公布日期 2004.07.29
申请号 WO2003EP14255 申请日期 2003.12.15
申请人 SIEMENS AKTIENGESELLSCHAFT;BOSTANJOGLO, GEORG;KRUEGER, URSUS;REICHE, RALPH;STEINBACH, JAN 发明人 BOSTANJOGLO, GEORG;KRUEGER, URSUS;REICHE, RALPH;STEINBACH, JAN
分类号 C30B11/00;C30B29/52 主分类号 C30B11/00
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