发明名称 Inspection microscope for several wavelength ranges and reflection reducing layer for an inspection microscope for several wavelength ranges
摘要 An inspection microscope for several wavelength ranges with at least one illuminating beam path and at least one imaging beam path is disclosed. Those optical elements in the illuminating beam path and in the imaging beam path, through which beams of all wavelengths pass, are provided with a reflection reducing layer, by means of which the wavelength ranges with reduced reflection are the visible VIS-wavelength range up to 650 nm, the i-lines at lambda=365 nm and the ultraviolet DUV-wavelength range from 240 nm to 270 nm. The reflection reducing layer is a sandwich structure, comprising various material combinations, such as for example, M2/MgF2 or M2/MgF2/SiO2 or M2/MgF2/Al203, where M2 is a mixed substance from the company Merck, comprising La2O3.3,3 Al203. The optical components with reduced reflectance preferably comprise quartz glass or CaF2.
申请公布号 US2004145803(A1) 申请公布日期 2004.07.29
申请号 US20030475653 申请日期 2003.10.23
申请人 EISENKRAMER FRANK 发明人 EISENKRAMER FRANK
分类号 G02B1/11;G02B21/00;G02B21/06;G02B21/16;(IPC1-7):G02B5/08;F21V9/04;F21V9/06;G02B5/20 主分类号 G02B1/11
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