发明名称 Ferroelectric memory structure and fabrication method thereof
摘要 A ferroelectric memory structure is disclosed. The ferroelectric memory structure includes a substrate, an insulating layer formed on the substrate, a plurality of oxide electrodes formed on the insulating layer, a ferroelectric layer formed on the insulating layer and the plurality of oxide electrodes, and a plurality of metallic electrodes formed on the ferroelectric layer and corresponding to the plurality of the oxide electrodes.
申请公布号 US2004145003(A1) 申请公布日期 2004.07.29
申请号 US20040758628 申请日期 2004.01.15
申请人 NATIONAL CHIO-TUNG UNIVERSITY 发明人 TSENG TSEUNG-YUEN;LEE S.Y.
分类号 H01L21/316;H01L21/02;H01L21/28;H01L21/8246;H01L21/8247;H01L27/105;H01L29/788;H01L29/792;(IPC1-7):H01L29/76;H01L29/94 主分类号 H01L21/316
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