摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sprayed coating film excellent in both electrical insulation property and corrosion resistance by solving the problem of oxygen deficiency which cannot be solved through conventional compacting of a sprayed coating film, and its production method. <P>SOLUTION: The sprayed coating film, formed through plasma spraying onto the interior of semiconductor processing equipment, is composed of a metal oxide or a semiconductor oxide. Here, the composition ratio (oxygen/(metal or semiconductor)) of oxygen to the metal or the semiconductor composing the oxide is ≥80% of the composition ratio of the stoichiometric composition. <P>COPYRIGHT: (C)2004,JPO&NCIPI |