Semiconductor wafer processing apparatus

摘要

A photolithography apparatus includes: an air supply line supplying an air to a chamber processing a wafer; a temperature and humidity adjuster provided to the air supply line; a temperature and humidity monitoring sensor sensing temperature and humidity internal to the chamber; and a controller connected to the temperature and humidity monitoring sensor and the temperature and humidity adjuster to control the temperature and humidity adjuster to supply the chamber via the air supply line with an air having the same temperature and humidity as those of the air in the chamber detected by the temperature and humidity monitoring sensor.