HIGH FREQUENCY POWER SUPPLY DEVICE AND PLASMA GENERATOR

摘要

A high frequency power supply device and a plasma generator using the high frequency power supply device comprise two or more of inductive antennas (1), high frequency power supplies (2, 4) for supplying electric power to the respective antennas (1) and a vacuum container (6) so arranged that the respective antennas (1) generate a plasma therein by application of high frequency power. The high frequency power supplies (2, 4) are respectively arranged close to corresponding antennas (1). Consequently, variations in the high frequency voltages generated at the respective antennas (1) can be suppressed, so that a more uniform plasma can be generated even when a plasma generating portion has a larger diameter or a larger volume. Therefore, formation of a thin film or plasma ion implantation using such a plasma can be stabilized.