| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an induction coupled antenna with improved uniformity of plasma, capable of reducing a capacity coupling, power loss, and damage generated at a base board, and provide a plasma processing device using the same. <P>SOLUTION: The induction coupled antenna 120 is composed of a coil turned in plurality, and constructed so that the current I1 flowing through the outermost turn T1 is higher than the current I2, I3 flowing through the turns T2, T3 at the center region arranged at the inside of the outermost turn T1. For the above, the outermost turn T1 and the turn T2 at the center region are connected in parallel with an RF power source 130, and the turns T2, T3 at the center region are serially connected to each other. The antenna 120 has a conductive metal tube 121 having a cooling water channel 122 and a conductive metal strip 123 brought into electrically and thermally contact with the lower part of the conductive metal tube 121. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
