| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for preparation of a silicon-containing compound suitable for preparing a resist material soluble in water and capable of carrying out a water development, wherein the resist material has an extremely good dimensional stability with suppressed swelling property while keeping resistance to a reactive oxygen ion etching (O<SB>2</SB>RIE). <P>SOLUTION: The method comprises regulation of hydrophilicity-hydrophobicity ratio by adjusting molar ratio of an oligo-oxyalkylene compound of formula (I) and an oligo-siloxane compound of formula (II), in preparation of a compound of formula (III) by carrying out a polycondensation reaction of the oligo-oxyalkylene compound of formula (I) and the oligo-siloxane compound of formula (II), to obtain a polymer compound which has a turbidity point exhibiting solubility to water in a relatively low temperature region and insolubility to water at a temperature region higher than the low temperature region. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
