| 摘要 |
Provided is a method of fabricating a microlens array. The method includes forming a cylindrical photoresist mask on one side of a substrate using a photolithographic process, forming the photoresist mask as a profile corresponding to a microlens by melting the photoresist mask using a reflow process, forming the microlens on the substrate by transferring the profile of the photoresist mask to the substrate using plasma etching, forming a photoresist having a surface profile for refining a curved surface of the microlens on the surface of the microlens, and transferring the curved profile of the photoresist to the surface of the microlens by etching the photoresist using plasma etching. By this method, a high-performance microlens having a precise curved surface, a high numerical aperture (NA), and low aberration can be fabricated.
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