发明名称 |
PROCESS FOR THE PRODUCTION OF RESIST FLUOROPOLYMER |
摘要 |
<p>The invention provides a novel process for producing fluoropolymers, specifically, a process for producing photoresist fluoropolymers which are transparent to vacuum ultraviolet rays, particularly, F2 laser (157nm), and excellent in solubility in alkaline developers; and photoresist compositions containing the photoresist fluoropolymers. The process is a process for producing a resist fluoropolymer excellent in solubility in developers which comprises repeating units (M2)of alicyclic structure in the backbone chain and has in the polymer either acid-reactive groups (Y<1>) or groups (Y<2>) convertible into acid-reactive groups (Y<1>), characterized by radical-polymerizing a monomer mixture containing a monomer (m2) capable of imparting alicyclic structure to the backbone chain in the presence of both a radical polymerization initiator and a chain transfer agent represented by the general formula (1): R - (X)n (1) wherein R is a C1-20 hydrocarbon group optionally containing an ether linkage in which part of the hydrogen atoms may be replaced by fluorine; X is at least one functional group selected from the group consisting of oxygen-containing functional groups and substituted and unsubstituted amino groups; and n is an integer of 1 to 4.</p> |
申请公布号 |
WO2004063235(A1) |
申请公布日期 |
2004.07.29 |
申请号 |
WO2004JP00031 |
申请日期 |
2004.01.07 |
申请人 |
DAIKIN INDUSTRIES, LTD.;ARAKI, TAKAYUKI;ISHIKAWA, TAKUJI;TORIUMI, MINORU |
发明人 |
ARAKI, TAKAYUKI;ISHIKAWA, TAKUJI;TORIUMI, MINORU |
分类号 |
C08F214/18;C08F14/18;(IPC1-7):C08F214/18 |
主分类号 |
C08F214/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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