发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <p>A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.</p>
申请公布号 AU2003296188(A1) 申请公布日期 2004.07.29
申请号 AU20030296188 申请日期 2003.12.24
申请人 JSR CORPORATION 发明人 ISAO NISHIMURA;KOUICHI FUJIWARA;EIICHI KOBAYASHI;TSUTOMU SHIMOKAWA;ATSUSHI NAKAMURA;EIJI YONEDA;YONG WANG
分类号 C08F4/00;G03F7/004;G03F7/039;(IPC1-7):G03F7/004 主分类号 C08F4/00
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