| 摘要 |
PROBLEM TO BE SOLVED: To provide a rotation and revolution type barrel etching device, a processing vessel and a media therefor. SOLUTION: In order to achieve the purpose, the rotation and revolution type barrel etching device is provided with a revolution shaft, provided vertically to the surface of installation of the device, and the inclination of the axis of rotation is 0°-45°with respect to the axis of revolution toward the revolution axis side while a site of at least contacting with etching solution is provided with a resistance to chemicals and the shape of the working vessel is substantially cylindrical while one end of the working vessel is closed by a bottom unit having a predetermined curvature or a bottom unit constituted of the curved bottom with the predetermined curvature and a plane unit and the other end of the same is opened and is sealed tightly by a lid. The inner surface of the working vessel is provided with recesses and projections while a media, having a resistance to chemicals with respect to the etching solution, is used. COPYRIGHT: (C)2004,JPO&NCIPI |
