HEAT-TREATMENT APPARATUS USED IN MAGNETIC FIELD

摘要

PROBLEM TO BE SOLVED: To provide a heat-treatment apparatus used in a magnetic field which yields a high-quality semiconductor element and can be downsized. SOLUTION: The heat-treatment apparatus used in a magnetic field has a tubular heat-treatment furnace (3) which is laid down so that it has its central axis (O) in the horizontal direction. Outside this heat-treatment furnace (3), a tubular superconducting solenoid magnet (1) having the same central axis (O) as the heat-treatment furnace (3) is installed to form a uniform magnetic field in parallel with the central axis (O) within the heat-treatment furnace (3). The apparatus also has heating means (6) of the heat-treatment furnace (3) and wafer-conveying units (5) inside the heat-treatment furnace (3) to enable continuous heat treatment of a wafer. COPYRIGHT: (C)2004,JPO&NCIPI