发明名称 FREQUENCY ADJUSTING METHOD FOR SURFACE ACOUSTIC WAVE DEVICE AND ELECTRONIC EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To realize a surface acoustic wave device for which highly accurate frequency adjustment can be performed, and which can be stably operated for a long period because a central frequency subjected to the adjustment has less secular change. <P>SOLUTION: The thickness h of an IDT electrode 2 formed on a quartz substrate 1 is set so that it is a little thicker than a target thickness and the central frequency becomes a little lower than a target value (S1). Next, a voltage is applied to the IDT electrode 2 to start measurement of the central frequency (S2). At this time, the central frequency to be measured is a little lower than the target value. Therefore, the rear surface 1b of the quartz substrate 1 is etched while confirming a measuring frequency (S3). As a result, due to the etching, the central frequency to be measured increases gradually to reach the target value. Then, the etching is continued (S3, S4) until the central frequency becomes equal to the target value, and the etching is stopped at the time when the central frequency reaches the target value (S5). <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004215226(A) 申请公布日期 2004.07.29
申请号 JP20030319554 申请日期 2003.09.11
申请人 SEIKO EPSON CORP 发明人 OSHIO MASAHIRO
分类号 H03B5/30;H03H3/08;H03H3/10;H03H9/02;H03H9/05;H03H9/25;H03H9/64 主分类号 H03B5/30
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