发明名称 ANTIREFLECTION FILM, ITS MANUFACTURING METHOD AND SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide an antireflection film that excels, at low cost, in wear resistance, chemical resistance, and adhesion between a hard coat layer and an antireflection layer, and also to provide its manufacturing method and formed product. <P>SOLUTION: In the antireflection film, the hard coat layer and the antireflection layer are successively laminated on a substrate film. The hard coat layer is formed with a thermal cross-linking reaction product of a resin composition which contains, as effective components, 100-300 g/eq (meta) acrylic equivalent, 50-550 mg KOH/g hydroxyl value, 7,000 g/eq or above epoxy equivalent, 5,000-100,000 weight average molecular weight polymer, and a thermosetting agent. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004212619(A) 申请公布日期 2004.07.29
申请号 JP20020381699 申请日期 2002.12.27
申请人 NAKAJIMA KOGYO KK;KYOEISHA CHEM CO LTD 发明人 NAKAMURA YUZO;MIYAKE HIROTOMO;MANO HIDESATO
分类号 G02B1/11;B32B7/02;B32B27/30;G02B1/10 主分类号 G02B1/11
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