| 摘要 |
PROBLEM TO BE SOLVED: To provide a contamination barrier minimizing undesirable deformation of thin films, which is related to a foil trap for a lithographic projection apparatus. SOLUTION: This foil trap has an open structure which transmits radiation from an EUV source or the like without interference. The foil trap is equipped with thin films positioned to trap scrap particles from a radiation source. The thin films extend in the radius direction from the foil trap axis. To avoid mechanical stress, the thin films are connected to one or both of the grooves of rings so that they can slide. This structure allows the thin films to extend easily and avoids mechanical stress, resulting in no deformation in the thin films. At least one of the outer ends of the thin films is thermally connected to the rings. These rings can be cooled with a cooling system. In a preferred embodiment, the foil trap is equipped with a shield which prevents the inner ring from being irradiated with an EUV beam. COPYRIGHT: (C)2004,JPO&NCIPI |
