| 摘要 |
PROBLEM TO BE SOLVED: To form a supply opening with high precision and good reproducibility by connecting a trench cut from the surface side of a substrate with a trench cut from the rear surface side of the substrate. SOLUTION: A trench 100 is formed in the surface side of a substrate 1, a sacrifice layer being dissolved by wet etching for forming a trench 5 from the rear surface side of the substrate 1 is formed in a region of the substrate 1 contiguous to that trench 100, and then a protective film 95 is formed to cover the trench 100 and the sacrifice layer. On the rear surface of the substrate 1, a rear surface etching mask layer 99 having an opening in a specified region is formed. The trench 5 is formed by performing wet etching from the rear surface of the substrate 1 using the rear surface etching mask layer 99 as a mask. The trench 5 is widened by continuing the wet etching and after the protective film 95 formed on the surface of the trench 100 is exposed in the trench 5, exposed part of the protective film 95 is removed thus connecting the trenches 5 and 100. COPYRIGHT: (C)2004,JPO&NCIPI
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