POSITION MEASUREMENT METHOD, POSITION MEASUREMENT DEVICE, EXPOSURE METHOD, AND EXPOSURE DEVICE

摘要

Highly-accurate focus adjustment is performed by eliminating adverse affect attributed to reflectivity distribution. Detection light is applied to a measurement position on a substrate and reflected light reflected from the measurement position is received, thereby measuring position information in the normal direction of the substrate surface. The position measurement method includes a step for measuring an error component of the position information caused by reflectivity distribution of the detection light at the measurement position on the substrate and a step for correcting the position information in the normal direction according to the error component measured.