发明名称 DEVICE, METHOD, AND SYSTEM FOR PATTERN FORMING
摘要 <p>In a pattern-forming device (10), a mold (100) for forming a pattern on a substrate (200) is heated to a temperature (T1) equal to or higher than a glass transition temperature (Tg) of a surface layer portion of the substrate (200). In this state, the mold (100) is pressed on the substrate (200) having a temperature equal to or lower than the glass transition temperature (Tg), so that a pattern of the mold (100) is copied. After that, a heater is switched off, the mold (100) is cooled by a cooling block, and then the mold (100) is separated from the substrate (200). It is preferable that a pattern-forming system is formed by providing the pattern-forming device (10) with a feeding device for taking out substrates (200) one by one from a magazine and sequentially feeding them to the pattern-forming device (10).</p>
申请公布号 WO2004062886(A1) 申请公布日期 2004.07.29
申请号 WO2003JP15731 申请日期 2003.12.09
申请人 SCIVAX CORPORATION;HAKUTO CO., LTD.;GOTO, HIROSHI;FUJII, MITSURU;YOSHIOKA, HARUO;KISHI, HIDEKI 发明人 GOTO, HIROSHI;FUJII, MITSURU;YOSHIOKA, HARUO;KISHI, HIDEKI
分类号 B29C31/00;B29C59/00;B29C59/02;(IPC1-7):B29C59/02 主分类号 B29C31/00
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