发明名称 |
DEVICE, METHOD, AND SYSTEM FOR PATTERN FORMING |
摘要 |
<p>In a pattern-forming device (10), a mold (100) for forming a pattern on a substrate (200) is heated to a temperature (T1) equal to or higher than a glass transition temperature (Tg) of a surface layer portion of the substrate (200). In this state, the mold (100) is pressed on the substrate (200) having a temperature equal to or lower than the glass transition temperature (Tg), so that a pattern of the mold (100) is copied. After that, a heater is switched off, the mold (100) is cooled by a cooling block, and then the mold (100) is separated from the substrate (200). It is preferable that a pattern-forming system is formed by providing the pattern-forming device (10) with a feeding device for taking out substrates (200) one by one from a magazine and sequentially feeding them to the pattern-forming device (10).</p> |
申请公布号 |
WO2004062886(A1) |
申请公布日期 |
2004.07.29 |
申请号 |
WO2003JP15731 |
申请日期 |
2003.12.09 |
申请人 |
SCIVAX CORPORATION;HAKUTO CO., LTD.;GOTO, HIROSHI;FUJII, MITSURU;YOSHIOKA, HARUO;KISHI, HIDEKI |
发明人 |
GOTO, HIROSHI;FUJII, MITSURU;YOSHIOKA, HARUO;KISHI, HIDEKI |
分类号 |
B29C31/00;B29C59/00;B29C59/02;(IPC1-7):B29C59/02 |
主分类号 |
B29C31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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