发明名称 Process for the production of niobium or tantalum parts by electrochemical etching
摘要 The etching process for the manufacture of the molded product is performed under electrochemical conditions such that the mean deviation of the noise associated with electric current for etching is 5-10%. The solution used for etching includes water soluble polymer.
申请公布号 EP1441049(A1) 申请公布日期 2004.07.28
申请号 EP20030028017 申请日期 2003.12.06
申请人 H.C. STARCK GMBH 发明人 GOTTSCHLING, MARIANNE;LOEFFELHOLZ, JOSUA DR.;ALBERT, MATHIAS DR.;SADOWSKI, GUENTER DR.
分类号 C25F3/12;B23H3/00;B23H9/00;C25D1/10;C25F;C25F3/02;C25F3/08;H01G9/00;H01G9/04;H01G13/00;(IPC1-7):C25F3/08 主分类号 C25F3/12
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