发明名称 |
Plasma CVD film forming apparatus and method for manufacturing CVD film coating plastic container. |
摘要 |
The restriction that the outer electrode of a conventional CVD film forming apparatus has to have a hollow structure including a hollow which is for accommodating a container and has a shape generally similar to the outer shape of the container is eliminated. A plasma CVD film forming apparatus is characterized in that a container outside gas is supplied into the space defined between the inner wall of an outer electrode and the outer surface of a container spaced from the inner wall, the plasma thereby produced from the container outside gas in forming a film by CVD serves as a conductor and transmits high-frequency to the outer wall of the container, a state is brought about in which the inner wall of the outer electrode is equivalently in contact with the outer surface of the plastic container, and a uniform self-bias voltage is applied to the inner wall of the container. |
申请公布号 |
ZA200309541(B) |
申请公布日期 |
2004.07.28 |
申请号 |
ZA20030009541 |
申请日期 |
2003.12.09 |
申请人 |
MITSUBISHI SHOJI PLASTICS CORPORATION YOUTEC CO., LTD. |
发明人 |
KENICHI HAMA;TSUYOSHI KAGE;KEISHU TAKEMOTO;TAKUMI KOBAYASHI |
分类号 |
C23C16/04;C23C16/26;C23C16/50;C23C16/505 |
主分类号 |
C23C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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