发明名称 Illumination apparatus, projection exposure apparatus, and device fabricating method
摘要 An exposure apparatus having an exposure mode that transfers a pattern on a reticle (120) onto an object (140), and a standby mode that waits for exposure includes an optical system for introducing the exposure light to the object in the exposure mode, and a mechanism for allowing the exposure light to enter the reticle and/or the optical system in the standby mode, and for preventing the exposure light from entering the object in the standby mode.
申请公布号 EP1441257(A2) 申请公布日期 2004.07.28
申请号 EP20040001593 申请日期 2004.01.26
申请人 CANON KABUSHIKI KAISHA 发明人 HARA, SHINICHI
分类号 G02B17/06;G03F7/20;H01L21/027;(IPC1-7):G03F7/20;G02B26/00;H01L21/00 主分类号 G02B17/06
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