Photomask with dust-proofing device and exposure method using the same

摘要

It is an object of the present invention to provide a photomask equipped with a dust-proofing device which has high ultraviolet transmittance in a short wavelength region and high light resistance and is free from the necessity of the substitution with inert gas and also to provide an exposure method using this photomask. The photomask equipped with a dust-proofing device is produced by overlapping a ultraviolet ray-transmittable transparent substrate on the side of the light-shading film pattern surface of the photomask to apply the photomask to the transparent substrate tightly by exhausting and removing the air present between the photomask and the transparent substrate. A transparent film which transmits ultraviolet rays may be formed on the surface of the photomask on the side of a light-shading film pattern surface and a ultraviolet ray-transmittable transparent substrate may be overlapped on the transparent film to apply the photomask to the transparent substrate tightly by exhausting and removing the air present between the transparent film and the transparent substrate.