Device and method for wavelength dependent light outcoupling

摘要

The invention relates to an exposure apparatus, in particular for wavelength-dependent light outcoupling, in which at least one preferably wavelength-dependent mirror layer is located within an exposure beam path of a lamp, which mirror layer is used to divide the beam path into a spectral portion used for exposure, and into an unused spectral portion. The object of the invention is to provide an exposure apparatus and a method with which the quality of exposure can be optimized using simple means. The object on which the invention is based is attained according to the invention by locating a mirror in the beam path of the unused region of the spectrum that reflects the unused spectral range in the direction of a mirror layer, and a portion of this is projected onto a viewing screen for adjustment purposes.