RADIATION SENSITIVE RESIST COMPOSITION USEFUL AS AN ACID-AMPLIFIED NON-POLYMERIC RESIST MATERIAL, WHICH COMPRISES A COMPOUND HAVING A SPECIFIC CHEMICAL STRUCTURE AND AN ACID OR BASE GENERATOR

摘要

PURPOSE: Provided are a radiation sensitive composition that is sensitive not only to ultraviolet rays such as i-rays and g-rays but also to radiation such as visible lights, excimer lasers from KrF, etc., electron beams, X-rays and ion beams, and a simple method of producing a non-polymeric radiation sensitive resist composition that exhibits a high sensitivity, a high resolution, a high heat resistance and a good solubility to solvent. CONSTITUTION: The resist composition comprises at least one resist compound satisfying all the following requirements (a) to (f): (a) containing at least one acid-dissociating functional group in molecule thereof, (b) containing at least one kind of functional group selected from the group consisting of urea group, urethane group, amido group and imido group in a molecule thereof, (c) having a molecular weight of 500 to 5,000, (d) having a branched structure, (e) satisfying the formula: 3<=F<=5, wherein F is represented by (number of total atoms)/(number of total carbon atoms-number of total oxygen atoms), and (f) having a nitrogen content of 1 to 20% by mass; and at least one acid or base generator capable of directly or indirectly generating an acid or a base by exposure to radiation selected from the group consisting of visible lights, ultraviolet rays, excimer lasers, electron beams, X-rays and ion beams, wherein the branched structure is a chemical structure satisfying at least one of the following requirements (1) to (4): (1) having a tertiary carbon atom or a tertiary nitrogen atom which is not included in a cyclic structure; (2) having a quaternary carbon atom; (3) having at least one aromatic ring or aliphatic ring having three or more substituent groups; and (4) having a tertiary phosphorus atom, and wherein the resist compound satisfying all the requirements (a) to (e) has at least one acid-dissociating functional group in each of branched molecular chains thereof, the branched molecular chains each having at least one functional group selected from the group consisting of urea group, urethane group, amido group and imido group.