| 发明名称 |
Method of cleaning a CVD reaction chamber using an active oxygen species |
| 摘要 |
Provided herein is a method for cleaning CVD reaction chambers with active oxygen species. The active oxygen species may also be mixed with active fluorine species. The active oxygen species are products of a plasma, which may be either generated within the CVD reaction chamber or generated remotely and introduced into the CVD reaction chamber.
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| 申请公布号 |
US6767836(B2) |
申请公布日期 |
2004.07.27 |
| 申请号 |
US20020235217 |
申请日期 |
2002.09.04 |
| 申请人 |
ASM JAPAN K.K. |
发明人 |
SAN NELSON LOKE CHOU;KAGAMI KENICHI;SATOH KIYOSHI |
| 分类号 |
C23C16/44;H01L21/205;H01L21/314;H01L21/316;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
C23C16/44 |
| 代理机构 |
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