发明名称 Defect inspecting device for substrate to be processed and method of manufacturing semiconductor device
摘要 A defect inspecting device for a wafer is built in a positioning device for positioning a wafer 1, as a substrate to be processed, in a semiconductor manufacturing process. Light is irradiated on the wafer held on a vacuum holding base 2 while rotating the wafer at least one rotation from a position where the wafer is positioned and the scattered light is received. An operation unit 14 and a control unit 15 judge that if the intensity of the scattered light exceeds a predetermined threshold, a defect is detected on the wafer 1.
申请公布号 US6768542(B2) 申请公布日期 2004.07.27
申请号 US20020219292 申请日期 2002.08.16
申请人 RENESAS TECHNOLOGY CORP.;MITSUBISHI ELECTRIC ENGINEERING COMPANY LIMITED 发明人 ISE HIROTOSHI;OONO TOSHIKI;KIMURA YASUHIRO;KOMEMURA TOSHIO;TOYOTA MASATO;NOGUCHI TOSHIHIKO
分类号 G01B11/26;G01B11/30;G01N21/95;G01N21/956;H01L21/66;(IPC1-7):G01N21/00 主分类号 G01B11/26
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