| 摘要 |
PURPOSE: Provided are patterning devices with pellicles that are usable with photolithographic projection apparatus that provides a patterned projection beam or radiation, including 157 nm radiation, to print patterns on a substrate, and methods of manufacturing and cleaning patterning devices having the pellicles. CONSTITUTION: In a patterning device (30) for use in lithographic projection apparatus, the patterning device comprises a blank layer (31) formed of quartz, glass, MgF, or CaF2; a patterned layer (32) of layer of opaque material on a surface of the blank layer; and a layer (40) of perfluoropolyether (PFPE) liquid on the surface of blank layer that covers the surface. In a method of manufacturing a patterning device for use in photolithographic apparatus, the method comprises the steps of providing a patterning device having a blank layer and a patterned layer of opaque material on a surface of the blank layer; applying perfluoropolyether (PFPE) liquid to the surface of the blank layer that covers the surface to form a PFPE liquid layer; and removing at least a portion of the PFPE liquid layer. In a method of cleaning a patterning device for use in photolithographic projection apparatus, the patterning device including a blank layer and a patterned layer of opaque material on a surface of the blank layer, the method comprises the steps of applying perfluoropolyether (PFPE) liquid to the surface of the blank layer that covers the surface to form a PFPE liquid layer; and removing at least a portion of the PFPE liquid layer. |
