发明名称 PLASMA FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent any film from sticking on the side of a plasma film forming apparatus without making the flow of its processing gas turbulent, in the atmospheric-plasma film forming apparatus. SOLUTION: A nozzle end plate 11 (an opposite portion to a base material) to be opposed to the base material 90 of a film forming apparatus M1 has a region 11 R<SB>1</SB>provided with processing-gas blowing holes, and has regions 11 R<SB>2</SB>so protruded therefrom as to gain the film forming rate of its processing gas. Also, inert-gas introducing means 20 are connected respectively with grooves 11b formed on the reverse sides of the opposite surfaces to the base materials present in the regions 11R<SB>2</SB>. The plate 11 is constituted out of porous ceramics. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004207617(A) 申请公布日期 2004.07.22
申请号 JP20020377333 申请日期 2002.12.26
申请人 SEKISUI CHEM CO LTD 发明人 ANZAI JUNICHIRO;NAKATAKE SUMIO;NAKANO YOSHINORI;KAWASAKI SHINICHI
分类号 C23C16/455;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/455
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